Center for Materials for Information Technology
Facilities
Processing
- 10 target Ultra-Clean Magnetron Sputtering System with insitu Auger Analysis
- 8 target Ultra-Clean Magnetron Sputtering System with insitu RHEED Analysis
- Dispersion Mills
- Electron Beam Evaporation System
- Energy Sciences Electron Beam Processor
- Headway Model EC101 Spin Coater
- Key Four Target RF-DC Sputtering System
- March Instruments Plasma Etcher
- Pilot Tape Coating System
- Planetary Mixer
- Quintel Contact/ Proximity Mask Aligner
- Tape Calendar and Slitter
- Tenny Environmental Chamber
- Vac-Tec Four Target RF-DC Multilayer Sputtering System
- Vacuum Annealing System
- Veeco Ion Mill
- Wire Bonder
Characterization
- 35 GHz Ferromagnetic Resonance Spectrometer
- Bio-Rad FTIR
- DC and AC Electrochemical Corrosion Systems
- Digital Instruments/Veeco AFM/MFM
- Digital Measurement Systems Vibrating Sample Magnetometer and Torque Meter
- Hysitron Nanoindenter System
- Kratos Auger/XPS Surface Analysis System
- MOKE microscope
- Nanoindenter IIa Mechanical Properties Microprobe
- Oscillating Shear Viscometer
- Oxford Instruments High Field, Variable Temperature Vibrating Sample Magnetometer
- Princeton Alternating Gradient Magnetometer
- Quantum Design Squid Magnetometer
- Rheometric Digital Thermal Mechanical Analyzer
- Rigaku D/MAX-2BX Horizontal XRD Thin Film Diffractometer
- Variable Angle Spectroscopic Ellipsometer
- Vector Magnetometer
Computational Facilities
- 30 node Beowulf Cluster
- Electronic Structure codes
- LLG micromagnetics codes
- Molecular Dynamics codes
- Monte Carlo codes
- SGI workstations
In addition to the equipment listed above, which is shared with the MINT Center, the Central Analytical facility in the Bevill Building contains a Philips XL30 SEM with Edax Attachment, HitachiH-8000 TEM/STEM, JEOL 8600 Microprobe, a Philips X-Ray Diffractometer and a Kratos Auger XPS/AFM/SAM Spectrometer. New additions include a dual beam Focused Ion Beam System, a JEOL Field Emission Gun Scanning Electron Microscope with EDAX, WDS, and e-beam lithography, an FEI Technai Supertwin Transmission Electron Microscope and a Hitachi 9000 SEM. It is supported by three Ph.D. level full-time research scientists.
All of the facilities in the MRSEC are available to faculty outside the MRSEC on an as-available basis at a fixed daily rate for support and maintenance.